Unlike macroscopic and micrometer-sized solid electrodes whose surface can be reproducibly cleaned by mechanical polishing, cleaning the nanoelectrode surface is challenging because of its small size and extreme fragility. Even very gentle polishing typically changes the nanoelectrode size and geometry, thus, complicating the replication of nanoelectrochemical experiments. In this letter, we show the possibility of cleaning nanoelectrode surfaces nondestructively by using an air plasma cleaner. The effects of plasma cleaning have been investigated by atomic force microscopy (AFM) imaging, voltammetry, and scanning electrochemical microscopy (SECM). A related issue, the removal of an insoluble organic film from the nanoelectrode by plasma cleaning, is also discussed.
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