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首页> 外文期刊>Analytical chemistry >Analysis Of The Interface And Its Position In C_(60~(n+)) Secondary Ion Mass Spectrometry Depth Profiling
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Analysis Of The Interface And Its Position In C_(60~(n+)) Secondary Ion Mass Spectrometry Depth Profiling

机译:C_(60〜(n +))二次离子质谱深度分析中的界面及其位置分析

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C_(60~(n+)) ions have been shown to be extremely successful for SIMS depth profiling of a wide range of organic materials, causing significantly less degradation of the molecular information than more traditional primary ions. This work focuses on examining the definition of the interface in a C_(60~(n+)) SIMS depth profile for an organic overlayer on a wafer substrate. First it investigates the optimum method to define the organic/inorganic interface position. Variations of up to 8 nm in the interface position can arise from different definitions of the interface position in the samples investigated here. Second, it looks into the reasons behind large interfacial widths, i.e., poor depth resolution, seen in C_(60~(n+)) depth profiling. This work confirms that, for Irganox 1010 deposited on a wafer, the depth resolution at the Irganox 1010/substrate interface is directly correlated to the roughening of material.
机译:C_(60〜(n +))离子已成功用于多种有机材料的SIMS深度剖析,与传统的一次离子相比,对分子信息的降解明显更少。这项工作的重点是检查C_(60〜(n +))SIMS深度剖面中界面的定义,以了解晶片基板上有机覆盖层的情况。首先,它研究了定义有机/无机界面位置的最佳方法。在此处研究的样品中,界面位置的不同定义可能会导致界面位置发生最大8 nm的变化。其次,研究了C_(60〜(n +))深度剖析中界面宽度较大的原因,即深度分辨率差。这项工作证实,对于在晶片上沉积的Irganox 1010,Irganox 1010 /基板界面处的深度分辨率与材料的粗糙化直接相关。

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