Selective Removal of DNA-Labeied Nanoparticles from Planar Substrates by DNA Displacement Reactions

摘要

With the great progress that has been made in the synthesis and assembly of nanomaterials during the past decades,there has been an ever-increasing interest in developing new methods to selectively manipulate nanomaterials that function as nanomachines for promising applications in nano-mechanics,nanoelectronics,nanobiotechnology,etc.To precisely control the nanomachines,both quantitative and kinetic studies of the manipulation processes are indispensable because they would provide not only determinative proof of the successful accomplishment of the manipulation,but also a deeper understanding of the process and a solid basis for further applications.One of the most promising ways to accomplish these aims is to fabricate nanomachines on planar substrates because,firstly,with the development of advanced lithographic techniques,predesigned micro or nanopatterns can be formed,which provides a fascinating way to integrate top-down and bottom-up techniques to fabricate nanomachines.Secondly,with the development of modern surface techniques,different facile,reliable methods have been developed to characterize the nanostructures on planar substrates,which would allow the convenient study of the surfaces quantitatively and in real time.