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Tuning the Electronic Structure of Graphene by Molecular Dopants: Impact of the Substrate

机译:通过分子掺杂剂调节石墨烯的电子结构:衬底的影响

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摘要

A combination of ultraviolet and X-ray photoelectron spectroscopy, X-ray absorption spectroscopy, and first principle calculations was used to study the electronic structure at the interface between the strong molecular acceptor 1,3,4,5,7,8-hexafluorotetracyano-naphthoquinodimethane (F6TCNNQ) and a graphene layer supported on either a quartz or a copper substrate. We find evidence for fundamentally different charge redistribution mechanisms in the two ternary systems, as a consequence of the insulating versus metallic character of the substrates. While electron transfer occurs exclusively from graphene to F(6)TCNNQ on the quartz support (p-doping of graphene), the Cu substrate electron reservoir induces an additional electron density flow to graphene decorated with the acceptor monolayer. Remarkably, graphene on Cu is n-doped and remains n-doped upon F(6)TCNNQ deposition. On both substrates, the work function of graphene increases substantially with a F(6)TCNNQmonolayer atop, the effect being more pronounced (similar to 1.3 eV) on Cu compared to quartz (similar to 1.0 eV) because of the larger electrostatic potential drop associated with the long-distance graphene-mediated Cu-F6TCNNQ electron transfer. We thus provide a means to realize high work function surfaces for both p- and n-type doped graphene.
机译:结合使用紫外线和X射线光电子能谱,X射线吸收光谱和第一原理计算来研究强分子受体1,3,4,5,7,8-六氟四氰基-之间的界面电子结构萘醌二甲烷(F6TCNNQ)和支撑在石英或铜基板上的石墨烯层。我们发现,由于衬底的绝缘与金属特性,两个三元体系中的电荷重新分配机理根本不同。虽然电子仅发生从石墨烯到石英载体上的F(6)TCNNQ的转移(石墨烯的p掺杂),但是Cu衬底电子库诱导了额外的电子密度流向装饰有受体单层的石墨烯。值得注意的是,Cu上的石墨烯是n掺杂的,在F(6)TCNNQ沉积后仍保持n掺杂。在两种衬底上,石墨烯的功函都随着顶部的F(6)TCNNQ单层的增加而显着增加,与石英(近似于1.0 eV)相比,Cu对铜的作用更为明显(近似于1.3 eV),因为相关的静电势降更大与长距离石墨烯介导的Cu-F6TCNNQ电子转移。因此,我们提供了一种为p型和n型掺杂石墨烯实现高功函数表面的方法。

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