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首页> 外文期刊>Chemical Physics Letters >Decomposition processes of H3NBH3 (borazane), (BH)(3)(NH)(3) (borazine), and B(CH3)(3) (trimethylboron) on heated W wire surfaces
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Decomposition processes of H3NBH3 (borazane), (BH)(3)(NH)(3) (borazine), and B(CH3)(3) (trimethylboron) on heated W wire surfaces

机译:H3NBH3(硼烷),(BH)(3)(NH)(3)(硼嗪)和B(CH3)(3)(三甲基硼)在加热的W线表面上的分解过程

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摘要

The decomposition mechanisms of H3NBH3, (BH)(3)(NH)(3), and B(CH3)(3) on heated W wire surfaces were examined using mass spectrometric and laser spectroscopic techniques. These chemicals can be source materials for catalytic chemical vapor deposition as well as for B-atom doping. All the species could be decomposed well when the wire temperature was over 2.0 x 10(3) K. When H-2 was introduced, the production of B atoms was confirmed in the decomposition of H3NBH3 and B(CH3)(3), but not for (BH)(3)(NH)(3). H3NBH3 and B(CH3)(3) may be candidates as safe precursors for B-atom doping, while (BH)(3)(NH)(3) could be a viable candidate as aBN film precursor. (C) 2015 Elsevier B.V. All rights reserved.
机译:使用质谱和激光光谱技术研究了H3NBH3,(BH)(3)(NH)(3)和B(CH3)(3)在加热的W丝表面上的分解机理。这些化学物质可以作为催化化学气相沉积以及B原子掺杂的原料。当焊丝温度超过2.0 x 10(3)K时,所有物质都可以很好地分解。当引入H-2时,在H3NBH3和B(CH3)(3)的分解中确认了B原子的产生,但是不适用于(BH)(3)(NH)(3)。 H3NBH3和B(CH3)(3)可以作为B原子掺杂的安全前体,而(BH)(3)(NH)(3)可以作为aBN膜的前体。 (C)2015 Elsevier B.V.保留所有权利。

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