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Computational studies on the mechanisms for the gas-phase reaction between thiophene and NO3

机译:噻吩与NO3气相反应机理的计算研究

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G3MP2B3 calculations have been performed to investigate the potential energy surface for the reaction of thiophene with NO3 radical. Both direct hydrogen abstraction pathways and addition-elimination pathways have been found. The reaction is shown to start with an exothermic barrierless addition of NO3 to the double bond of thiophene ring to give thiophene-ON(O) O intermediate (IM1), possibly, IM1A and IM2. Intermediate IM1 can generate various products including P5 + NO2, P4 (C(S) HCH=CHC(O)H) + NO2, P6 (C(S) HCH=CHC(H) ONO2), and P3 + H. The most energetically favorable channel is found to be the formation of P5 by loss of NO2 from intermediate IM1. The calculations are inconsistent with the available experimental results.
机译:已经进行了G3MP2B3计算以研究噻吩与NO3自由基反应的势能面。直接氢提取途径和加成消除途径均已发现。已表明该反应开始于向噻吩环的双键无放热地添加NO3,从而生成噻吩-ON(O)O中间体(IM1),可能是IM1A和IM2。中间IM1可以生成各种产品,包括P5 + NO2,P4(C(S)HCH = CHC(O)H)+ NO2,P6(C(S)HCH = CHC(H)ONO2)和P3 +H。发现能量上有利的通道是由于中间体IM1损失NO2而形成P5。计算结果与可用的实验结果不一致。

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