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LPE Growth of Bismuth Substituted Iron Garnet Films with in-plane Magnetization

机译:平面内磁化铋取代铁石榴石薄膜的LPE生长

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摘要

We developed high quality Bi substituted Lu iron garnet (Bi,Lu)_3(Fe,Ga)_5O_(12) films with in-plane magnetization to use for magneto-optical imaging (MOI). These films were grown on 1-ineh (100) orientated Gd_3Ga_50_(12) substrates by liquid phase epitaxy (LPE) using PbO-B_2O_3 flux. In particular, in order to reduce defect density in the film, we optimized the melt composition and growth temperature. We could almost remove defects caused by adhesion of fine garnet crystallites by increasing the amount of flux. The in-plane magnetization was obtained by controlling the stress-induced anisotropy caused by the lattice misfit between film and substrate. These high quality Bi garnet films had the Faraday rotation coefficient theta F of-690 approx -810 deg/mm at 633nm, the saturation magnetization 4perpendicular M_s of 30mT and the perpendicular saturating field H_s of 120mT at room temperature.
机译:我们开发了具有平面内磁化的高质量Bi取代的Lu铁石榴石(Bi,Lu)_3(Fe,Ga)_5O_(12)膜,用于磁光成像(MOI)。这些薄膜使用PbO-B_2O_3助熔剂通过液相外延(LPE)在1-ineh(100)取向的Gd_3Ga_50_(12)衬底上生长。特别是,为了降低薄膜中的缺陷密度,我们优化了熔体成分和生长温度。通过增加助焊剂的量,我们几乎可以消除由细石榴石微晶的粘附引起的缺陷。通过控制由膜和基板之间的晶格失配引起的应力感应各向异性来获得面内磁化强度。这些高质量的Bi石榴石薄膜在633nm处的法拉第旋转系数θF为-690约-810 deg / mm,在室温下的饱和磁化强度4垂直M_s为30mT,垂直饱和磁场H_s为120mT。

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