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Mechanical Characteristics of AlGaN Thin Films by Nanoindentation and Transmission Electron Microscopy

机译:纳米压痕和透射电镜观察AlGaN薄膜的力学性能

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This article reports a nanomechanical response study of the contact-induced deformation behavior in Al_(0.16)Ga_(0.84)N thin film by means of a combination of nanoindentation and the cross-sectional transmission electron microscopy (XTEM) techniques. Al_(0.16)Ga_(0.84)N thin film is deposited by using the metal-organic chemical vapor deposition (MOCVD) method. Hardness and Young's modulus of the Al_(0.16)Ga_(0.84)N films were measured by a Berkovich nanoindenter operated with the continuous contact stiffness measurements (CSM) mode. The obtained values of the hardness and Young's modulus are 19.76 ± 0.15 GPa and 310.63 ± 9.41 GPa, respectively. The XTEM images taken in the vicinity regions just underneath the indenter tip revealed that the multiple "pop-ins" observed in the load-displacement curve during loading are due primarily to the activities of dislocation nucleation and propagation. The absence of discontinuities are in the unloading segments of load-displacement curve suggests that no pressure-induced phase transition was involved.
机译:本文结合纳米压痕和截面透射电子显微镜(XTEM)技术,对Al_(0.16)Ga_(0.84)N薄膜中接触诱导的变形行为进行了纳米力学响应研究。通过使用金属有机化学气相沉积(MOCVD)方法沉积Al_(0.16)Ga_(0.84)N薄膜。 Al_(0.16)Ga_(0.84)N薄膜的硬度和杨氏模量通过采用连续接触刚度测量(CSM)模式操作的Berkovich纳米压头测量。所获得的硬度和杨氏模量的值分别为19.76±0.15GPa和310.63±9.41GPa。在压头尖端正下方的附近区域拍摄的XTEM图像显示,加载过程中在加载-位移曲线中观察到的多个“弹入”主要归因于位错成核和扩散的活动。在载荷-位移曲线的卸载段中没有不连续性,这表明不涉及压力引起的相变。

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