Fabrication of Sub-100 nm Linewidth Grating Patterns Using Nanoimprint Lithography

摘要

Nanoimprint Lithography (NIL) is a promising technology enabling the fabrication of nanoscale patterns with low cost. In order to be a mainstream lithography NIL should overcome the current technical limitations, which will take several years. However, a state-of-the-art NIL can find a short-term application in nano-structured optical devices and bio-devices, where the multiplayer process is not required. As one of working examples of applying NIL to the nanostructured optical devices, fabrication of sub-100 nm line-width grating patterns is described in this manuscript with a particular emphasis on the nano wire polarizer.