Electrochemical pore formation onto semiconductor surfaces

摘要

In this paper, a review on electrochemical porous etching of semiconductors is proposed. After a brief history, chemical and electrochemical etching of semiconductors are considered and the pore formation models are discussed. The influences of the key parameters on porous etching are illustrated by listing the numerous pore morphologies reported in the literature. A short inventory of typical applications in various fields is given in the conclusion.