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SYNTHESIS AND PROPERTIES OF Tb-DOPED GaN NANOWIRES

机译:Tb掺杂GaN纳米线的合成与性能

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The synthesis of Tb-doped GaN nanowires on Si (111) substrates through ammoniating Ga_2O_3 films doped with Tb was investigated. X-ray photoelectron spectroscopy, X-ray diffraction, scanning electron microscope, high-resolution transmission electron microscopy and photoluminescence were used to characterize the composition, structure, morphology and optical properties of the products. The results show that the as-synthesized GaN nanowires doped with 3 at. % Tb are of single-crystalline hexagonal wurtzite structure. The nanowires have diameters ranging from 20 to 50 nm and the lengths up to tens of micrometers. An f-f intra-atomic transition of rare earth at 545 nm corresponding to ~5D~4-~7F_5 of the Tb~(3+) and other two peaks related with doping are observed in PL spectrum, confirming the doping of Tb into GaN. The growth mechanism of GaN nanowires was discussed briefly.
机译:研究了通过氨化掺有Tb的Ga_2O_3膜在Si(111)衬底上合成掺Tb的GaN纳米线的方法。 X射线光电子能谱,X射线衍射,扫描电子显微镜,高分辨率透射电子显微镜和光致发光被用来表征产物的组成,结构,形态和光学性质。结果表明,所合成的GaN纳米线掺杂了3 at。 Tb%是单晶六方纤锌矿结构。纳米线的直径范围为20至50 nm,长度可达数十微米。在PL光谱中观察到稀土元素在545 nm处的f-f原子内跃迁,对应于Tb〜(3+)的〜5D〜4-〜7F_5,以及与掺杂相关的其他两个峰,证实了Tb向GaN的掺杂。简要讨论了GaN纳米线的生长机理。

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