Measurement of reaction probability r (H_2, O_2, H_2O) on Nd films surface under ultra high vacuum condition

摘要

We measured the reaction probability r of hydrogen (H_2), oxygen (O_2), water(H_2O) on Nd film surface under ultra high vacuum condition, when the Nd films reacted with H_2,O_2 and H_2O. The Nd films exhibited the highest reaction probability r=1 for each gas (H_2,O_2,H_2O) at initial stage. With increasing amounts of reacted H_2, the reaction probability of H_2 decreased gradually. However in the case of the O_2 reaction, r decreased rapidly, and the gas amount reacted was very small compared with that of r to H_2. Among these gas reactions, the highest initial reaction probability, r=1 for H_2O was found to proceed longest.