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Preparation of Lead Chromate Crystalline Thin Films by RF-Magnetron Sputtering Method

机译:磁控溅射法制备铬酸铅晶体薄膜

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摘要

Crystalline thin films of lead chromates, Pb_(1+ chi)CrO_(4+chi)(0 < =x< = 1) could be prepared by RF-magnetron sputtering using a PbCrO_4 target under the atmosphere of 3Pa Argon and 1 Pa oxygen. The chromates formed were composed of PbCrO_4 and Pb_2CrO_5, and the relative compositions of the two phases changed rather sensitively with a change in RF power and substrate temperature. A single phase of PbCrO_4 (chi=0) was formed when both the power and the temperature were low, (eg; 100 W and 300 deg C), while that of Pb_2CrO_5 (chi=1) was under the opposite conditions (eg; 200 W and 550 deg C), with the mixture being obtained under the intermediate conditions.
机译:可以在3Pa的氩气和1Pa的氧气气氛下使用PbCrO_4靶通过RF磁控溅射制备铬酸铅晶体薄膜Pb_(1+ chi)CrO_(4 + chi)(0 <= x <= 1) 。形成的铬酸盐由PbCrO_4和Pb_2CrO_5组成,并且两相的相对组成随RF功率和基板温度的变化而相当敏感地变化。当功率和温度都较低时(例如100 W和300℃),形成了单相PbCrO_4(chi = 0),而在相反的条件下(例如,100 W和300℃)则形成了Pb_2CrO_5(chi = 1)。 200 W和550摄氏度),混合物是在中间条件下获得的。

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