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Nanostructured doped zinc oxide thin solid films: the effect of different doping elements on the electrical and morphological properties

机译:纳米结构掺杂氧化锌薄膜固体薄膜:不同掺杂元素对电学和形态学特性的影响

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摘要

Zinc oxide (ZnO) is a multifunctional semiconductor with a wide direct band gap (3.3 eV); due to its tunable optoelectronic characteristics it is one of the transparent conductive oxides (TCO) materials most commonly used as front and back transparent conductors in photovoltaic cells (PVC) architecture. The electrical and optical properties of TCO materials strongly depend on the crystalline defects (oxygen vacancies/interstitial zinc) and on the nature, as well on the amount of foreign atoms trapped in the host lattice. In this study a summary of some results of ZnO thin solid films deposited by the pneumatic spray pyrolysis technique, and doped with several different atoms, namely, Fluorine (F), Gallium (Ga) and Indium (In), are given. The materials synthesis was carried out for each doped ZnO film with a systematic variation in: substrate temperature, and doping concentration of the starting solutions. The influence of the variations of these deposition parameters on the electrical and structural properties of the ZnO films synthesized is presented and discussed.
机译:氧化锌(ZnO)是一种具有宽直接带隙(3.3 eV)的多功能半导体;由于其可调节的光电特性,它是透明导电氧化物(TCO)材料之一,最常用作光伏电池(PVC)体系结构中的正面和背面透明导体。 TCO材料的电学和光学特性在很大程度上取决于晶体缺陷(氧空位/间隙锌)和性质,以及取决于捕获在主体晶格中的外来原子的数量。在这项研究中,总结了通过气动喷雾热解技术沉积并掺杂了几个不同原子(即氟(F),镓(Ga)和铟(In))的ZnO薄膜的一些结果。对每种掺杂的ZnO膜进行材料合成,但系统温度会发生变化:衬底温度和起始溶液的掺杂浓度。提出并讨论了这些沉积参数的变化对合成的ZnO薄膜的电学和结构性能的影响。

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