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首页> 外文期刊>Journal of Ceramic Processing Research. (Text in English) >Fabrication of transparent superhydrophobic ZnO thin films by a wet process
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Fabrication of transparent superhydrophobic ZnO thin films by a wet process

机译:湿法制备透明的超疏水ZnO薄膜

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Transparent superhydrophobic ZnO thin films were fabricated on glass substrates by a liquid phase deposition (LPD) method and a surface modification scheme using fluoroalkyltrimethoxysilane (FAS). The hexagonal ZnO rods were perpendicularly grown on glass substrates coated with ZnO seed layers. The diameters of the hexagonal ZnO rods and the thickness of thin films were increased according to the immersion time into an aqueous solution. The structure, surface roughness, transmittance and contact angle of prepared ZnO thin films were measured by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), an atomic force microscope (AFM), a UV-visible spectrophotometer (UV-vis) and contact angle measurements. The XRD pattern of ZnO thin films showed diffraction peaks corresponding to the hexagonal wurtzite-type ZnO structure with an intense XRD peak from the (002) plane. Among the ZnO thin films prepared with different immersion conditions, the ZnO thin film prepared with an immersion time of 10 minutes showed a high transparency above 89% and a superhydrophobic surface property with a water contact angle of approximately 161° after a FAS treatment
机译:通过液相沉积(LPD)方法和使用氟烷基三甲氧基硅烷(FAS)的表面改性方案在玻璃基板上制备透明的超疏水ZnO薄膜。六角形ZnO棒垂直生长在涂有ZnO种子层的玻璃基板上。六角形ZnO棒的直径和薄膜的厚度根据在水溶液中的浸入时间而增加。通过X射线衍射(XRD),场发射扫描电子显微镜(FE-SEM),原子力显微镜(AFM),紫外可见分光光度计测量制备的ZnO薄膜的结构,表面粗糙度,透射率和接触角。 (UV-vis)和接触角测量。 ZnO薄膜的XRD图案显示的衍射峰对应于六方纤锌矿型ZnO结构,从(002)平面开始有强烈的XRD峰。在不同浸没条件下制备的ZnO薄膜中,浸没时间为10分钟的ZnO薄膜在FAS处理后显示出89%以上的高透明度和超疏水表面性能,水接触角约为161°

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