NEW PHOTOMASK DESIGNED FOR SEM MAGNIFICATION CALIBRATION

摘要

In preparation for the issuance of a new batch of the successful scanning electron microscope (SEM) magnification calibration artifacts, Reference Material (RM) 8090 and Standard Reference Material (SRM) 2090, NIST scientists have completed design of a new lithography photomask. In the past, all individual samples of RM 8090 or SRM 2090 were made by direct write electron-beam lithography, because optical lithography did not have the required resolution. That limitation has recently changed with the implementation of 193 nm lithography.