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Application of X-ray Fluorescence (XRF) Absolute Analysis Method for Silica Refractories

机译:X射线荧光绝对分析法在硅质耐火材料中的应用

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摘要

X-ray fluorescence (XRF) analysis is broadly utilized in industrial and academic fields as a rapid and precise analysis method for major and/or trace elements. XRF analysis is categorized as a relative method because the analysis is conducted with calibration curves which refer to certified analytical values of standard materials, such as Japanese Refractory Reference Materials (JRRM) series. Upgrading XRF analysis to an absolute method will be quite useful for determining absolute quantitative analytical values in the fields where standard materials are not available to provide a great contribution in many industries. When applying the XRF absolute analysis for multi-component silica refractories, the calibration curve is integrated with combining binary system basic calibration curves which are created with high purity reagents and/or a reference standard solution and coexisting component effect correction with theoretical coefficients. XRF absolute analysis on Al_2O_3 5 mass% samples provides 0.009 mass% of inter-group accuracy (reproducibility) and 0.006 mass % of inner-group accuracy (repeatability), both of which are better than those (0.028 and 0.031 mass%, respectively) analyzed with the ICP-AES method which is recognized as an absolute method in JIS R2212-2. XRF absolute analysis values on JRRM 200 series as well as renewed 201a and 205a are in good conformity to their certified values with no significant bias.
机译:X射线荧光(XRF)分析作为主要和/或痕量元素的快速而精确的分析方法,已在工业和学术领域得到广泛应用。 XRF分析被归类为一种相对方法,因为该分析是使用校准曲线进行的,该校准曲线是指标准材料(例如日本耐火参考材料(JRRM)系列)的认证分析值。在无法获得标准材料的领域中,将XRF分析升级为绝对方法将对确定绝对定量分析值非常有用,这在许多行业中都没有很大的贡献。当将XRF绝对分析应用于多组分二氧化硅耐火材料时,将校准曲线与由高纯度试剂和/或参考标准溶液创建的二元系统基本校准曲线相结合,并与理论系数共存组分效应校正值。对Al_2O_3 5质量%样品的XRF绝对分析提供了0.009质量%的组间准确度(可重复性)和0.006质量%的内组准确度(可重复性),两者均优于(分别为0.028和0.031质量%)使用ICP-AES方法进行分析,该方法在JIS R2212-2中被视为绝对方法。 JRRM 200系列以及更新的201a和205a的XRF绝对分析值与它们的认证值非常一致,没有明显的偏差。

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