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The effect of surface roughness on the head-tape interface

机译:表面粗糙度对头带界面的影响

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The effect of tape surface roughness on the head-tape interface is investigated for typical head contours using tapes with different surface roughness characteristics. Intensity-based monochromatic interferometry is used to obtain the asperitycompliance curves for tapes of different roughness by relating contact pressure to the spacing between the head and the tape. A parabolic model and the Greenwood-Williamson model for contact between rough surfaces are used to "curve fit" experimentalresults for contact pressure versus spacing, and numerical calculations for the head-tape spacing of a cylindrical head with and without transverse slots are presented for two tapes with different roughness characteristics. The numerical calculations forthe head-tape spacing are compared with experimental measurements showing excellent agreement between numerical and experimental results. It is concluded that the head-tape spacing for high recording density applications is limited by tape surfaceroughness.
机译:对于具有不同表面粗糙度特性的胶带,对于典型的磁头轮廓,研究了胶带表面粗糙度对胶带表面的影响。基于强度的单色干涉测量法通过将接触压力与磁头和胶带之间的间距相关联,来获得不同粗糙度胶带的粗糙一致性曲线。粗糙表面之间接触的抛物线模型和Greenwood-Williamson模型用于“拟合”接触压力与间距的实验结果,并给出了两个有或没有横向槽的圆柱头的头带间距的数值计算带具有不同的粗糙度特性。头带间距的数值计算与实验测量结果进行了比较,显示出数值和实验结果之间的极好的一致性。结论是,用于高记录密度应用的头带间距受到磁带表面粗糙度的限制。

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