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Controlling ablation mechanisms in sapphire by tuning the temporal shape of femtosecond laser pulses

机译:通过调整飞秒激光脉冲的时间形状来控制蓝宝石中的烧蚀机制

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We have analyzed the influence of the temporal pulse shape on femtosecond (fs) laser-induced surface ablation processes in sapphire. To this end, single transform-limited (TL), stretched, and third-order-dispersion (TOD) shaped fs pulses have been used, while the dynamics of the interaction were analyzed by fs-resolved microscopy and correlated with plasma emission intensity and crater morphology. The modification of the pulse shape enables changing the ablation mechanism from a strong, thermally mediated ablation process to a gentle ablation process mediated by Coulomb explosion (CE), with respective ablation depths of 100-200 nm and 5-10 nm. Analysis of the transient optical response allows direct comparison of the transient plasma carrier densities involved, observing comparable peak values for both processes. For strong ablation induced by TL pulses, a direct relation between plasma density and local ablation depth is found, but this does not hold for the CE-mediated process observed for TOD-shaped pulses. For TOD-shaped pulses at very high fluence, a different ablation mechanism involving explosive boiling is identified. This mechanism leads to the formation of deep craters with reduced lateral extension and steep walls. This amount of control over the ablation mechanisms by a simple selection of the pulse shape should be of interest for new surface structuring approaches. (C) 2014 Optical Society of America
机译:我们分析了时间脉冲形状对蓝宝石中飞秒(fs)激光诱导的表面烧蚀过程的影响。为此,已使用单变换限制(TL),拉伸和三阶分散(TOD)形状的fs脉冲,同时通过fs分辨显微镜分析了相互作用的动力学,并与等离子体发射强度和火山口形态。脉冲形状的改变使得能够将消融机制从强的,热介导的消融过程改变为由库仑爆炸(CE)介导的平缓的消融过程,消融深度分别为100-200 nm和5-10 nm。对瞬态光学响应的​​分析可以直接比较所涉及的瞬态等离子体载流子密度,并观察到两个过程的可比峰值。对于由TL脉冲引起的强消融,可以找到血浆密度与局部消融深度之间的直接关系,但这不适用于TOD形脉冲的CE介导过程。对于通量非常高的TOD形脉冲,确定了涉及爆炸沸腾的不同烧蚀机理。这种机制导致形成了具有减小的横向延伸和陡峭壁的深坑。对于新的表面结构化方法,通过简单选择脉冲形状来控制烧蚀机制的数量应引起关注。 (C)2014年美国眼镜学会

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