Mechanism of Embedded Micro/Nano Channel Formation for aNegative-tone Photoresist by Moving Mask Lithography

摘要

Photoresist lithography has been applied in MEMS (micro electro mechanical systems). A flex-ible 3D (three-dimensional) microano fabrication technique and its process simulation tool are required for 3D MEMS. This paper presents an UV (ultraviolet) lithography process simulation for the formation of an embedded microano fluidic channel in a negative-tone photoresist. For this purpose, the moving-mask technology is modeled. The simulation algorithm of the nano-lithography is applied for the micro-lithography. The validity of the simulation for the proposed 3D microstructuring is successfully confirmed by a comparison between the experimental and the sim-ulated results. Hence, modeling and simulation for the formation of various patterns of microano fluidic channels in a negative-tone photoresist can be used to provide the photoresist characteristics and to optimize the lithography process conditions.