...
首页> 外文期刊>Journal of the Korean Physical Society >Charge Transfer at the Interfaces of PolycrystallineZnO/Zn_(1-x)Mg_xO/ZnO Heterostructures
【24h】

Charge Transfer at the Interfaces of PolycrystallineZnO/Zn_(1-x)Mg_xO/ZnO Heterostructures

机译:ZnO / Zn_(1-x)Mg_xO / ZnO异质结构界面上的电荷转移

获取原文
获取原文并翻译 | 示例

摘要

Charge transfer at the interfaces of polycrystalline ZnO/Zn_(1-x)Mg_xO(ZnMgO)/ZnO heterostruc-tures, which were grown on glass substrates by using ultrasonic spray pyrolysis, were investigatedby measuring the electrical and the optical properties of the heterostructures. Spectral blue shiftsof optical band gap were observed for ZnO/ZnMgO/ZnO heterostructures and were analyzed interms of Burstein-Moss and band-gap-renormalization effects to estimate the amount of chargetransfer. Compared to a single-layer Al-doped ZnO (ZnO:Al) films, the electrical properties of theZnO:Al/ZnMgO/ZnO:Al heterostructure were found to be enhanced with increasing electron mo-bility by a factor of 1.6. Even in these polycrystalline heterostructures, the conduction band offsetbetween ZnMgO and ZnO:Al can cause electron transfer at the interface and decrease the energybarrier at the grain boundaries, resulting in an enhanced of mobility.
机译:通过测量异质结构的电学和光学性质,研究了在多晶ZnO / Zn_(1-x)Mg_xO(ZnMgO)/ ZnO异质结构界面上的电荷转移,该异质结构是通过超声喷雾热解法生长在玻璃基板上的。观察到ZnO / ZnMgO / ZnO异质结构的带隙光谱蓝移,并分析了Burstein-Moss项和带隙重归一化效应的各项,以估计电荷转移的量。与单层掺杂Al的ZnO(ZnO:Al)薄膜相比,ZnO:Al / ZnMgO / ZnO:Al异质结构的电学性能随着电子迁移率的提高提高了1.6倍。即使在这些多晶异质结构中,ZnMgO和ZnO:Al之间的导带偏移也会在界面处引起电子转移,并降低晶界处的能垒,从而提高了迁移率。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号