首页> 外文期刊>Journal of the European Ceramic Society >Growth and characterisation of multiferroic BiFeO_3 films with fully saturated ferroelectric hysteresis loops and large remanent polarisations
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Growth and characterisation of multiferroic BiFeO_3 films with fully saturated ferroelectric hysteresis loops and large remanent polarisations

机译:具有完全饱和铁电磁滞回线和大剩余极化的多铁性BiFeO_3薄膜的生长和表征

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摘要

Multiferroic BiFeO_3 films have been deposited on a number of substrates by RF magnetron sputtering. Two routes were adopted in order to obtain the films of high phase purity and accurate stoichiometry. The first was to sputter films at room temperature and then the BiFeO_3 phase was formed after sintering at various temperatures under controlled ambient atmosphere. The second was to grow BiFeO_3 in-situ at high temperature during sputtering. Although the sintered films grown on SrTiO_3 substrates were epitaxial and showed better texture than the in-situ films, they had much poorer ferroelectric properties, due to the residual traces of intermediate phases formed during heating. Under right growth parameters, the in-situ films grown on the LaNiO_(3-x) buffered SrTiO_3 showed fully saturated ferroelectric hysteresis loops with large remanent polarisation of 64 mu C/cm~2. Piezoresponse force microscopy (PFM) was used to examine the ferroelectric domain structures. When scanned without DC bias, fine spontaneous domains were observed. Under + -10 V DC bias, PFM confirmed that the domains could be poled and switched.
机译:多铁性BiFeO_3膜已通过RF磁控溅射法沉积在许多基板上。为了获得高相纯度和精确化学计量的膜,采用了两种途径。首先是在室温下溅射薄膜,然后在各种温度下在受控的环境气氛下烧结后形成BiFeO_3相。第二是在溅射过程中在高温下原位生长BiFeO_3。尽管在SrTiO_3衬底上生长的烧结膜是外延的,并且比原位膜显示出更好的织构,但是由于加热过程中形成的中间相的残留痕迹,它们的铁电性能差得多。在正确的生长参数下,在LaNiO_(3-x)缓冲SrTiO_3上生长的原位膜显示出完全饱和的铁电磁滞回线,其剩余极化率为64μC / cm〜2。压电响应力显微镜(PFM)用于检查铁电畴结构。在没有直流偏置的情况下进行扫描时,观察到精细的自发域。在+ -10 V DC偏置下,PFM确认域可以被极化和切换。

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