首页> 外文会议>応用物ç†å­¦ä¼šå­¦è¡“講演会;応用物ç†å­¦ä¼š >Growth mechanism and ferroelectric domain structure study on epitaxial BiFeO_3 film grown on (La_(0.3)Sr_(0.7))(Al_(0.65)Ta_(0.35))O_3
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Growth mechanism and ferroelectric domain structure study on epitaxial BiFeO_3 film grown on (La_(0.3)Sr_(0.7))(Al_(0.65)Ta_(0.35))O_3

机译:增长机制和铁电域结构研究在外延BIFEO_3薄膜上生长(LA_(0.3)SR_(0.7))(AL_(0.65)TA_(0.35))O_3

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BiFeO_3 (BFO) film is epitaxially grown on the (La_(0.3)Sr_(0.7))(Al_(0.65)Ta_(0.35))O_3 (LSAT) substrates to investigate lattice mismatch effect on domain structure and lattice strain status within the BFO film. Atomic resolution scanning transmission electron microscope image, [Fig. 1(a)] selected area electron diffraction (SAED) pattern, and X-ray reciprocal space mapping (XRSM) clearly reveal that the lattice strain originating from the lattice mismatch between BFO and LSAT is relaxed by causing misfit dislocations in BFO film. [Fig. 1(a)] The SAED and XRSM data indicate crystal structure of BFO film is rhombohedral with space group of R3c assigned rhombohedral specific diffraction spots. In particular, XRSM acquired along two different in-plane orientations reveal that BFO layer consists of two different domains that were 90° off each other around surface normal orientation. Atomistic model based on the orientation relation found by SAED and XRSM shows the domain structure is consistent with so called 71° ferroelectric domain reported previously. [Fig. 1(b)] The lattice mismatch of ï½2.8% calculated based on the epitaxial relation is proposed to be too large to be stored as elastic strain within BFO layer.
机译:BIFEO_3(BFO)薄膜在(LA_(0.3)SR_(0.7))上外延生长(AL_(0.65)TA_(0.35))O_3(LSAT)基板,以研究BFO内的域结构和晶格应变状态的晶格失配效果电影。原子分辨率扫描透射电子显微镜图像,[图。如图1(a)]所选区域电子衍射(SAED)图案和X射线往复式空间映射(XRSM)清楚地表明,通过在BFO膜中引起错误的脱位来放松来自BFO和LSAT之间的晶格失配的晶格菌株。 [无花果。 1(a)] SAED和XRSM数据表示BFO薄膜的晶体结构是RHOMBESHEDRAL,具有r3c的空间组分配的菱形特异性衍射斑点。特别地,沿两个不同的面内取向获取的XRSM揭示了BFO层由两个不同的畴组成,该不同畴围绕表面正常取向彼此偏离90°。基于SAED和XRSM发现的基于定向关系的原子模型表示域结构与先前报道的所谓的71°铁电域一致。 [无花果。 1(b)]基于外延关系计算的ï½2.8%的晶格不匹配被提出得太大,不能在BFO层内作为弹性应变。

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