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首页> 外文期刊>Journal of the European Ceramic Society >Dielectric properties of sol-gel derived CaCu_3Ti_4O_(12) thin films onto Pt/TiO_2/Si(100) substrates
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Dielectric properties of sol-gel derived CaCu_3Ti_4O_(12) thin films onto Pt/TiO_2/Si(100) substrates

机译:Pt / TiO_2 / Si(100)衬底上溶胶-凝胶法制备的CaCu_3Ti_4O_(12)薄膜的介电性能

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摘要

The ultrahigh relative dielectric constant (K') values reported for the CaCu_3Ti_4O_(12) bulk ceramics (10~4 at RT) joined to their low thermal dependence, no phase transitions are expected between -173 and 330 deg C, make this material very promising for capacitor applications and certainly for microelectronics. The interest in the preparation of this material in thin film form is twofold, the understanding of its physical properties and the integration of this high K' oxide with the Si technology. In this work, the preparation of CCTO thin films onto Pt/TiO_2/SiO_2/Si(100) substrates is attempted using sol-gel processing and rapid thermal processing (RTP) at 650 deg C. Structural, microstructural and dielectric characterization of the films is performed. The results are commented and discussed on the light of the grain boundary effect on the dielectric constant and the possibility of application of these thin films in microelectronic devices.
机译:CaCu_3Ti_4O_(12)块状陶瓷(在室温下为10〜4)报道的超高相对介电常数(K')值与低热依赖性有关,预计在-173至330摄氏度之间不会发生相变,这使得该材料非常对于电容器应用,当然对于微电子领域,也很有希望。制备这种薄膜形式材料的兴趣是双重的,对它的物理性质的理解以及这种高K'氧化物与Si技术的集成都具有双重意义。在这项工作中,尝试在650摄氏度下使用溶胶-凝胶工艺和快速热处理(RTP)在Pt / TiO_2 / SiO_2 / Si(100)基板上制备CCTO薄膜。薄膜的结构,微结构和介电特性被执行。鉴于晶界对介电常数的影响以及这些薄膜在微电子器件中的应用可能性,对结果进行了评论和讨论。

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