Extracting Specific Domain Terminologies to Establish CMP Ontology-based Knowledge System

摘要

This research is to develop an ontology-based knowledge system (OBKS) with specific domain terminologies of chemical mechanical polishing (CMP) of silicon wafers that has been imperative in fabrication of integrated circuit (IC) in semiconductor industry. This system combined data mining platform and ontology-based platform technology that is aimed to provide core value and knowledge map of CMP for research and development. An application software, Protege 2000 that was developed in Stanford University has been used to construct specific domain terminologies from patents, journal papers, and technical reports into the OBKS of CMP. Results have shown that the OBKS can provide core knowledge and knowledge map of CMP to solve some empirical problems. Further integration with OBKS will be implemented with database system for innovation of CMP of silicon wafers.