首页> 外文期刊>Journal of surface investigation: x-ray, synchrotron and neutron techniques >Investigation of silicon structures with periodically varying porosity by X-ray diffractometry methods
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Investigation of silicon structures with periodically varying porosity by X-ray diffractometry methods

机译:用X射线衍射法研究孔隙度周期性变化的硅结构

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摘要

The features of formation of silicon structures with a periodically varying porosity are investigated by X-ray diffractometry. It is revealed that the magnitude of anode current density corresponding to the formation of a layer with higher porosity that is part of a multilayer porous structure also affects the porosity of a second, less porous layer. As time elapses, the single-crystalline matrix of which porous layers consist is amorphized and a structure consisting of amorphous layers with a periodically varying density arises.
机译:用X射线衍射法研究了孔隙率周期性变化的硅结构的形成特征。揭示了对应于作为多层多孔结构的一部分的具有较高孔隙率的层的形成的阳极电流密度的大小也影响了较少多孔的第二层的孔隙率。随着时间的流逝,由多孔层组成的单晶基质被非晶化,并且出现了由密度周期性变化的非晶层组成的结构。

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