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首页> 外文期刊>Journal of Sol-Gel Science and Technology >Three-layer tri-wavelength broadband antireflective coatings built from refractive indices controlled silica thin films
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Three-layer tri-wavelength broadband antireflective coatings built from refractive indices controlled silica thin films

机译:由折射率受控的二氧化硅薄膜制成的三层三波长宽带减反射涂层

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摘要

A three-layer tri-wavelength broadband antireflective (AR) coating with 100 % transmittance simultaneously at 1064, 532 and 355 nm was designed using TFCalc (TM) thin film design software. The refractive indices for the bottom, middle and top layers of the designed AR coating are 1.33, 1.21 and 1.10, respectively. To realize the designed AR coating, a template-free sol-gel process was proposed to regulate the refractive index of silica film from 1.09 to 1.44 by simple hybridization. Silica films with refractive index of 1.21-1.44 were prepared by the hybridization of acid-catalyzed silica and base-catalyzed silica, while organically modified silicates films with refractive index of 1.09-1.21 were prepared by the hybridization of tetraethoxysilane, methyltriethoxysilane and hexamethyldisilazane under base-catalyzed condition. These two hybridization methods could conveniently control the porosity, and hence the refractive index of films. Finally, the three-layer tri-wavelength broadband AR coating, which is very important in high-power laser systems, was realized with the transmittance of 99.9, 99.8 and 99.4 % at 1064, 532 and 355 nm, respectively.
机译:使用TFCalc(TM)薄膜设计软件设计了同时在1064、532和355 nm处具有100%透射率的三层三波长宽带增透膜(AR)。设计的增透膜的底层,中间层和顶层的折射率分别为1.33、1.21和1.10。为了实现设计的增透膜,提出了一种无模板的溶胶-凝胶工艺,通过简单的杂交将二氧化硅膜的折射率从1.09调节到1.44。通过酸催化的二氧化硅和碱催化的二氧化硅的杂交制备折射率为1.21-1.44的二氧化硅膜,而四乙氧基硅烷,甲基三乙氧基硅烷和六甲基二硅氮烷在碱下杂交制备的有机改性的硅酸盐膜的折射率为1.09-1.21。 -催化条件。这两种杂交方法可以方便地控制孔隙率,从而控制薄膜的折射率。最后,在高功率激光系统中非常重要的三层三波长宽带增透膜实现了在1064、532和355 nm处的透射率分别为99.9%,99.8%和99.4%。

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