Bottom-up and top-down approach for periodic microstructures on thin oxide films by controlled photo-activated chemical processes

摘要

Micropatterned oxide films were fabricated by controlling the photo-induced processes, such as buckling driven wrinkle formation and photomigration, in the photo monomer-oxide precursor hybrid films. The photo-induced process depended on the wavelength of the illuminated light, that is to say, the penetration depth of the UV light for polymerization; a uniform illumination of 254 nm light from the incoherent black light induces the surface buckling which resulted in the self-organized formation of a long-range ordered surface wrinkle structure (bottom-up process). On the other hand, 325 nm or 365 nm illumination enables us to fabricate a microstructure by the conventional photolithography technique, such as the mask method or holographic illumination (top-down process). The simultaneous illumination of the black light (uniform, 254 nm) and the He-Cd laser (holographic, 325 nm) resulted in the formation of a 2D micropattern in which the holographic gratings are formed by the holographic illumination together with the array of dots by surface buckling. This result indicates that the present microfab-rication offers an integration of the top-down and bottom-up approach to realize the simultaneous fabrication of multi-scale and complex microstructured thin oxide films for photonic applications.