A virtual metrology model based on recursive canonical variate analysis with applications to sputtering process

摘要

In data driven process monitoring, soft-sensor, or virtual metrology (VM) model is often employed to predict product's quality variables using sensor variables of the manufacturing process. Partial least squares (PLS) are commonly used to achieve this purpose. However, PLS seeks the direction of maximum co-variation between process variables and quality variables. Hence, a PLS model may include the directions representing variations in the process sensor variables that are irrelevant to predicting quality variables. In this case, when direction of sensor variables' variations most influential to quality variables is nearly orthogonal to direction of largest process variations, a PLS model will lack generalization capability. In contrast to PLS, canonical variate analysis (CVA) identifies a set of basis vector pairs which would maximize the correlation between input and output. Thus, it may uncover complex relationships that reflect the structure between quality variables and process sensor variables. In this work, an adaptive VM based on recursive CVA (RCVA) is proposed. Case study on a numerical example demonstrates the capability of CVA-based VM model compared to PLS-based VM model. Superiority of the proposed model is also presented when it applied to an industrial sputtering process.