Modeling and analysis machine for a combined X-ray and optically based metrology

摘要

Structure parameters of a sample are determined by fitting models of the response of the sample to the measurements taken by different measurement methods in a combined study. Models of the sample's response from at least two different measurement technologies share at least one common geometric parameter. In some embodiments, a model-building and analyzing machine performs x-ray and optical analyzes, wherein at least one common parameter is coupled during the analysis. The fit of the response models to the measurement data can be performed sequentially, in parallel, or by a combination of sequential and parallel analyzes. In another aspect, the structure of the response models is changed based on the goodness of fit between the models and the corresponding measurement data. For example, a geometric model of the sample is restructured based on the fit between the response models and the corresponding measurement data.