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Syntheses and characterizations of thermally degradable epoxy resins. III

机译:可热降解环氧树脂的合成与表征。三级

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In flip-chip technology, the development of reworkable underfill materials has been one of the keys to the recovery of highly integrated and expensive board assembly designs through the replacement of defective chips. This article reports the syntheses, formulations, and characterizations of two new diepoxides, one containing secondary ester linkages and the other containing tertiary ester linkages, that are thermally degradable below 300 degreesC. The secondary and tertiary ester diepoxides were synthesized in three and two steps, respectively. Both compounds were characterized with NMR and Fourier transform infrared spectroscopy and formulated into underfill materials with an anhydride as the hardener and an imidazole as the catalyst. A dual-epoxy system was also formulated containing the tertiary ester diepoxide and a conventional aliphatic diepoxide, 3,4-epoxy cyclohexyl methyl-3,4-epoxycyclohexyl carboxylate (ERL-4221E), with the same hardener and catalyst. The curing kinetics of the formulas were studied with differential scanning calorimetry (DSC). Thermal properties of cured samples were characterized with DSC, thermogravimetric analysis, and thermomechanical analysis. The dual-epoxy system showed a viscosity of 18.7 and 0.87 P at 25 and 100 degreesC, respectively. The cured secondary, tertiary, and dual-epoxy formulas showed decomposition temperatures around 265, 190, and 220 degreesC, glass-transition temperatures around 120-140, 110-157, and 140-157 degreesC, and coefficients of thermal expansion of 70, 72, and 64 ppm/degreesC below their glass-transition temperatures, respectively. The shear strength of the cured dual-epoxy system decreased quickly with aging at 230 degreesC. The reworkability test showed that the removal of a chip underfilled with this material from the board was quite easy, and the residue on the board could be thoroughly removed with a mechanical brush without obvious damage to the solder mask. In summary, the synthesized tertiary epoxide can be used as a reworkable underfill for flip-chip applications. (C) 2002 Wiley Periodicals, Inc. [References: 19]
机译:在倒装芯片技术中,可返工的底部填充材料的开发一直是通过更换有缺陷的芯片来恢复高度集成且昂贵的电路板组装设计的关键之一。本文报道了两种新的二环氧化物的合成,配方和表征,一种包含仲酯键,另一种包含叔酯键,它们在300℃以下可热降解。仲和叔酯二环氧化合物分别通过三个步骤和两个步骤合成。两种化合物均通过NMR和傅里叶变换红外光谱进行了表征,并配制成了以酸酐为硬化剂和咪唑为催化剂的底部填充材料。还配制了一种双环氧体系,该体系包含叔酯二环氧和常规脂族二环氧,3,4-环氧环己基甲基-3,4-环氧环己基羧酸盐(ERL-4221E),以及相同的固化剂和催化剂。用差示扫描量热法(DSC)研究配方的固化动力学。通过DSC,热重分析和热机械分析来表征固化样品的热性能。双环氧体系在25和100℃下的粘度分别为18.7和0.87P。固化的仲,叔和双环氧配方的分解温度约为265、190和220℃,玻璃化温度约为120-140、110-157和140-157℃,热膨胀系数为70,分别比其玻璃化转变温度低72和64 ppm /℃。固化的双环氧体系的剪切强度随230℃的老化而迅速下降。可返工性测试表明,从板上清除填充有该材料的芯片非常容易,并且可以用机械刷彻底清除板上的残留物,而不会明显损坏阻焊层。总之,合成的叔环氧化物可用作倒装芯片应用的可返修底部填充胶。 (C)2002 Wiley Periodicals,Inc. [参考:19]

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