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Syntheses and characterizations of a controlled thermally degradable epoxy resin system for electronic packaging

机译:电子包装用可控热降解环氧树脂体系的合成与表征

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In flip-chip technology, reworkable underfill development has been key to the recovery of highly integrated board assembly designs by replacing defective chips. This paper reports the synthesis, formulation and characterization of two new diepoxides containing secondary and tertiary ester linkages that are thermally degradable below 300/spl deg/C. The secondary and tertiary ester diepoxides were synthesized in three and two steps, respectively. The compounds were characterized via NMR and FTIR spectroscopy, and formulated into underfills with anhydride hardener and imidazole catalyst. A dual-epoxy system was also formulated using tertiary ester diepoxide and an aliphatic diepoxide, ERG-4221E, with the same hardener and catalyst. The curing kinetics were studied by DSC. Thermal properties of cured samples were studied by DSC, TGA and thermomechanical analysis (TMA). The dual-epoxy system showed a viscosity of 18.7, and 0.87 Poise at 25/spl deg/C and 190/spl deg/C, respectively. The cured secondary, tertiary and dual-epoxy formulas showed decomposition temperatures around 265/spl deg/C, 190/spl deg/C and 220/spl deg/C, glass transition temperatures (T/sub g/) around 120-140/spl deg/C, 110-157/spl deg/C and 140-157/spl deg/C, and CTE of 70 ppm//spl deg/C, 72 ppm//spl deg/C and 64 ppm//spl deg/C below their T/sub g/, respectively. The shear strength of the cured dual-epoxy system decreased quickly upon being aged at 230/spl deg/C. Reworkability tests showed that removal from the board of a chip underfilled with this material was easy and the board residue could be removed with a mechanical brush without obvious damage to the solder mask. In summary, the synthesized tertiary epoxide can be used as a reworkable underfill for flip-chip applications.
机译:在倒装芯片技术中,可返工的底部填充开发一直是通过更换有缺陷的芯片来恢复高度集成的电路板组件设计的关键。本文报道了两种新的包含仲和叔酯键的新二环氧化物的合成,配方和表征,它们在300 / spl deg / C以下可热降解。仲酯和叔酯二环氧化合物分别通过三个步骤和两个步骤合成。通过NMR和FTIR光谱对化合物进行表征,并用酸酐硬化剂和咪唑催化剂配制为底部填充胶。还使用叔酯二环氧化合物和脂族二环氧化合物ERG-4221E以及相同的固化剂和催化剂配制了双环氧体系。通过DSC研究固化动力学。通过DSC,TGA和热机械分析(TMA)研究了固化样品的热性能。双环氧体系在25 / spl deg / C和190 / spl deg / C下的粘度分别为18.7和0.87泊。固化的仲,叔和双环氧配方的分解温度约为265 / spl deg / C,190 / spl deg / C和220 / spl deg / C,玻璃化温度(T / sub g /)约为120-140 / spl deg / C,110-157 / spl deg / C和140-157 / spl deg / C,CTE为70 ppm // spl deg / C,72 ppm // spl deg / C和64 ppm // spl deg / C分别低于其T / sub g /。固化的双环氧体系的剪切强度在230 / spl deg / C时效时迅速下降。可返工性测试表明,用这种材料轻松填充未填充这种材料的芯片很容易,并且可以用机械刷清除残留的电路板,而不会明显损坏阻焊层。总而言之,合成的叔环氧化物可用作倒装芯片应用的可返工底部填充胶。

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