Development of Photosensitive Alicyclic Polyimides Based on Reaction Development Patterning

摘要

Photosensitive polymers change their solubility into developer by photo-irradiation and form fine pattern by succeeding development, and thus they are important materials to prepare semiconductor integrated circuit [1, 2]. In use of photosensitive polymers for electronics packaging such as buffer coats and interlayer dielectrics, they remain in manufactures permanently, and therefore, they are required to have high thermal, mechanical and insulating properties. For such the applications, addition of photosensitivity to polyimides, known as representative high performance engineering plastics, has been investigated [3].