Calculation of the optical and electronic properties of TiNx thin films on domain IR-VIS-UV

摘要

In this paper, the dependence of the optical properties of thin titanium nitride films deposited by reactive DC magnetron sputtering on different nitrogen pressures, as well as the electrical properties and mechanical properties is investigated. The normal reflectivity is measured in a range from 0.5 to 5.5 eV. The results have been fitted using a dielectric function which takes into account the presence of several Lorentz oscillators. Contributions to the absorption due to bound and conduction electrons are separated. This approach allows the computation of the mean free path of conduction electrons, screened plasma energy, and the optical conductivity, which informed about the nature of the defects in TiNx compound. (c) 2006 Elsevier B.V. All rights reserved.