Demonstration of spot size reduction by focussing amplitude modulated radially polarized light on a photoresist

摘要

Spot size reduction is demonstrated by printing focused spots from amplitude-modulated radially polarized light at the wavelength lambda = 405 nm on a photoresist. Amplitude modulation is realized by ring illumination and by application of an optimized amplitude distribution function. Amplitude modulation is implemented via spatial light modulator, which is followed by a specially designed radial wire grid polarizer to obtain high-quality radially polarized light. Comparison between full and amplitude modulated apertures of the written focused spots on a photoresist is performed. Rigorous simulations based on the Richards-Wolf integral are made to confirm experimental data.