Tight focussing by amplitude modulated radially polarized light in isotropic and anisotropic photoresists.

摘要

Two new proof-of-principle methods to achieve tight focus spots by amplitude modulated radially polarized light in isotropic and anisotropic photoresists are shown. These methods, can be generalized and applied in scattering of light by particles, polarization sensitive fluorescence, laser writing and material processing.