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Injection molding of high aspect ratio sub-100 nm nanostructures

机译:高长宽比低于100 nm纳米结构的注塑成型

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We have explored the use of mold coatings and optimized processing conditions to injection mold high aspect ratio nanostructures (height-to-width >1) in cyclic olefin copolymer (COC). Optimizing the molding parameters on uncoated nickel molds resulted in slight improvements in replication quality as described by height, width and uniformity of the nanoscopic features. Use of a mold temperature transiently above the polymer glass transition temperature (T_g) was the most important factor in increasing the replication fidelity. Surface coating of the nickel molds with a fluorocarbon-containing thin film (FDTS) greatly enhanced the quality of replicated features, in particular at transient mold temperatures above T_g. Injection molding using the latter mold temperature regime resulted in a bimodal distribution of pillar heights, corresponding to either full or very poor replication of the individual pillars. The poorly replicated structures on nickel molds with or without FDTS coatings all appeared fractured. We investigated the underlying mechanism in a macroscopic model system and found reduced wetting and strongly decreased adhesion of solidified COC droplets on nickel surfaces after coating with FDTS. Reduced adhesion forces are consistent with lowered friction that reduces the risk of fracturing the nanoscopic pillars during demolding. Optimized mold surface chemistry and associated injection molding conditions permitted the fabrication of square arrays of 40 nm wide and 107 nm high (aspect ratio >2.5) pillars on a 200 nm pitch.
机译:我们已经探索了使用模具涂料和优化的加工条件来注射成型环状烯烃共聚物(COC)中的高纵横比纳米结构(高宽比> 1)。通过对纳米特征的高度,宽度和均匀性进行描述,优化未涂覆镍模具上的成型参数会导致复制质量略有改善。暂时高于聚合物玻璃化转变温度(T_g)的模具温度的使用是提高复制保真度的最重要因素。用含碳氟化合物的薄膜(FDTS)对镍模具的表面涂层极大地提高了复制特征的质量,特别是在高于T_g的瞬时模具温度下。使用后一种模具温度状态的注塑成型导致了柱高的双峰分布,对应于单个柱的完全复制或非常差的复制。在有或没有FDTS涂层的镍模具上,复制不佳的结构都出现了断裂。我们在宏观模型系统中研究了潜在的机理,发现用FDTS涂覆后,镍表面上凝固的COC液滴的润湿性降低,粘附力大大降低。减小的粘附力与减小的摩擦力相一致,从而减小了脱模过程中使纳米柱破裂的风险。优化的模具表面化学性能和相关的注塑条件允许以200 nm的间距制造40 nm宽和107 nm高(纵横比> 2.5)柱的正方形阵列。

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