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首页> 外文期刊>Journal of Micromechanics and Microengineering >Fabrication of piezoelectric microcantilevers using LaNiO3 buffered Pb(Zr,Ti)O-3 thin film
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Fabrication of piezoelectric microcantilevers using LaNiO3 buffered Pb(Zr,Ti)O-3 thin film

机译:LaNiO3缓冲Pb(Zr,Ti)O-3薄膜制备压电微悬臂梁

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摘要

We have fabricated piezoelectric microcantilevers using LaNiO3 (LNO) buffered Pb(Zr-0.52, Ti-0.48)O-3 (PZT) thin films through the microelectromechanical system (MEMS) microfabrication process. It has been found that the LNO thin films reduce the degradation caused by wet and dry etching for the MEMS microfabrication process. The displacement of the microcantilevers with LNO thin films draws a symmetric butterfly curve against dc actuation, while that without LNO thin film draws an asymmetric butterfly curve. The transverse piezoelectric constant d(31) for the LNO buffered PZT thin films is -100 to -120 pm V-1 at a voltage of 10 to 30 V, which is more than twice that for non-buffered PZT thin films.
机译:我们通过微机电系统(MEMS)的微细加工工艺,使用LaNiO3(LNO)缓冲的Pb(Zr-0.52,Ti-0.48)O-3(PZT)薄膜制造了压电微悬臂梁。已经发现,LNO薄膜减少了用于MEMS微制造工艺的湿法和干法蚀刻引起的劣化。具有LNO薄膜的微悬臂梁的位移绘制了反对直流致动的对称蝶形曲线,而没有LNO薄膜的微悬臂梁的位移绘制了不对称的蝶形曲线。 LNO缓冲PZT薄膜的横向压电常数d(31)在10至30 V的电压下为-100至-120 pm V-1,是非缓冲PZT薄膜的两倍。

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