首页> 外文期刊>Journal of Micromechanics and Microengineering >Design, microfabrication and testing of a CMOS compatible bistable electromagnetic microvalve with latching/unlatching mechanism on a single wafer
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Design, microfabrication and testing of a CMOS compatible bistable electromagnetic microvalve with latching/unlatching mechanism on a single wafer

机译:在单个晶圆上具有闩锁/解锁机制的CMOS兼容双稳态电磁微阀的设计,微制造和测试

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This paper reports our work on the design, microfabrication and testing of a novel bistable electromagnetically actuated microvalve that is fully fabricated by surface micromachining on a single silicon wafer with a potentially CMOS compatible process. The microvalve has an overall diameter of 1600 mu m and an overall height of 600 mu m that includes the thickness of the silicon wafer. The microvalve consists of four main components: a soft magnetic (NiFe) base, an Au microcoil, a CoNiMnP permanent magnet and a soft magnetic (NiFe) membrane with supported legs. The latching and unlatching mechanism of the microvalve governs the bistable positions of the membrane. The microvalve was tested for its performance to open/unlatch and close/latch a flow of deionized water at flow rates of 10-50 mu l min(-1). The microvalve operates at a current of 0.43 A, and its power and energy consumption are of the order of 1.6 W and 16 mJ, respectively. The microvalve has a response time of 10 ms and a burst pressure of 7.8 kPa.
机译:本文报告了我们在新型双稳态电磁致动微型阀的设计,微加工和测试方面的工作,该双稳态电磁致动微型阀是通过在可能具有CMOS兼容工艺的单个硅片上进行表面微加工而完全制成的。微型阀的总直径为1600微米,总高度为600微米,其中包括硅晶片的厚度。微型阀由四个主要组件组成:软磁性(NiFe)基体,金微线圈,CoNiMnP永磁体和带有支撑脚的软磁性(NiFe)膜。微型阀的闩锁和解锁机构控制着膜的双稳态位置。测试了微型阀在去离子水流中以10-50μlmin(-1)的速度打开/打开和关闭/闩锁的性能。微型阀在0.43 A的电流下工作,其功率和能耗分别约为1.6 W和16 mJ。微型阀的响应时间为10毫秒,破裂压力为7.8 kPa。

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