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首页> 外文期刊>Journal of Microlithography, Microfabrication, and Microsystems. (JM3) >Nanocomposite approaches toward pellicles for 157-nm lithography
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Nanocomposite approaches toward pellicles for 157-nm lithography

机译:用于157 nm光刻的薄膜的纳米复合材料方法

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摘要

Pellicle materials for use at 157 nm must display sufficient transparency at this wavelength and adequate lifetimes to be useful. We blended a leading candidate fluoropolymer with silica nanoparticles to examine the effect on both the transparency and lifetime of the pellicle. It is anticipated that these composite materials may increase the lifetime by perhaps quenching reactive species and/or by dilution, without severely decreasing the 157-nm transmission. Particles surface-modified with fluorinated moieties are also investigated. The additives are introduced as stable nanoparticle dispersions to casting solutions of the fluo-ropolymers. The properties of these solutions, films, and the radiation-induced darkening rates are reported. The latter are reduced in proportion to the dilution of the polymer, but there is no evidence that the nanoparticles act as radical scavengers.
机译:在157 nm处使用的薄膜材料必须在此波长下显示足够的透明度和足够的使用寿命才能使用。我们将领先的候选含氟聚合物与二氧化硅纳米颗粒混合在一起,以研究对防护薄膜的透明度和使用寿命的影响。预计这些复合材料可以通过淬灭反应性物种和/或通过稀释来延长使用寿命,而不会严重降低157 nm透射率。还研究了用氟化部分进行表面改性的颗粒。将添加剂作为稳定的纳米颗粒分散体引入氟聚合物的流延溶液中。报告了这些溶液,薄膜的性质以及辐射引起的变暗率。后者与聚合物的稀释成比例地减少,但是没有证据表明纳米粒子充当自由基清除剂。

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