Rapid crystallization of silicon films using pulsed current-induced joule heating

摘要

Crystallization of silicon films formed on glass substrates was achieved by rapid-joule heating of Cr strips adjacently formed via 200-nm-thick SiO2 intermediate layers. 3-mus-pulsed voltages applied to the Cr strips caused a high joule heating intensity about 1 x 10(6) W/cm(2). Transmission electron microscopy measurements confirmed a crystalline grain size of 50-100 nm, 1-mum-long crystalline grain growth was observed just beneath of the edge of Cr strips. The activation of phosphorus atoms according to crystallization was also achieved. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 13]