首页> 外文期刊>Journal of new materials for electrochemical systems >Electrochemical preparation and Li-insertion of nanocrystalline NiCuO2 thin film
【24h】

Electrochemical preparation and Li-insertion of nanocrystalline NiCuO2 thin film

机译:纳米晶NiCuO2薄膜的电化学制备及嵌锂

获取原文
获取原文并翻译 | 示例
       

摘要

Nanocrystalline NiCuO2 thin film on stainless steel substrate has been prepared by an novel electrochemical route, that is cathodically electrodepositing NiCu alloy film followed by anodically oxidizing at room temperature. XRD Measurement shows that the film is polycrystalline with tetragonal structure of NiCuO2. It is observed from SEM that the oxide film is uniform without cracks and pinholes, and the estimated grain average size of as-prepared film is less than 50 nm. The electrochemical lithiation and de-lithiation of NiCuO2 thin film electrode delivers a reversible capacity of 540 mAh/g at 10 muA/cm(2) in the voltage range from 0.01 to 3.0 V The capacity retention is respectively about 82% and 78% at the 100 th cycle for the current density of 10 and 80 muA/cm(2).
机译:通过一种新颖的电化学途径制备了不锈钢基板上的纳米晶NiCuO2薄膜,该方法是阴极电沉积NiCu合金膜,然后在室温下进行阳极氧化。 XRD测量表明该膜是具有NiCuO 2的四方结构的多晶。从SEM观察到,氧化膜是均匀的,没有裂纹和小孔,估计的制备的膜的晶粒平均尺寸小于50nm。 NiCuO2薄膜电极的电化学锂化和去锂化在0.01到3.0 V的电压范围内在10 muA / cm(2)时可提供540 mAh / g的可逆容量。容量保持率分别为约82%和78%电流密度为10和80μA/ cm(2)的第100个周期。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号