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首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >Wavelength selective refractive index modulation in a ROMP derived polymer bearing phenyl- and ortho-nitrobenzyl ester groups
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Wavelength selective refractive index modulation in a ROMP derived polymer bearing phenyl- and ortho-nitrobenzyl ester groups

机译:含苯基和邻硝基苄基酯基的ROMP衍生聚合物中的波长选择性折射率调制

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摘要

Patterning and tuning of the refractive index in polymers by means of UV-light is of great interest for optical applications such as polymeric waveguides or optical data storage devices. In this contribution, we report on the synthesis of a polynorbornene based copolymer bearing ortho-nitrobenzyl and phenyl ester groups capable of undergoing the photo-induced cleavage reaction and in a subsequent step optionally the photo-Fries rearrangement upon irradiation with UV-light. The photoreaction of these aromatic ester groups was investigated by means of FTIR, UV-VIS and spectroscopic ellipsometry. Due to the difference in UV absorption of the photoreactive units, the o-nitrobenzyl ester can be selectively excited by UV-light above 300 nm, while a subsequent illumination with 254 nm induces the photo-Fries rearrangement of the remaining phenyl ester groups. The structural changes in the chemical composition upon UV illumination lead to significant changes in the refractive index of the polymeric materials. Whilst the photo-Fries rearrangement of the phenyl ester groups causes a remarkable increase in the refractive index, it was found that the photo-induced cleavage reaction of ortho-nitrobenzyl ester moieties causes a decrease of the refractive index. This fact enables a selective tailoring of the refractive index by the choice of the applied wavelength. In addition, a two-step irradiation procedure using a sequence of different wavelengths provides the possibility of erasing and even inverting the index contrast.
机译:借助于紫外线对聚合物中的折射率进行图案化和调谐对于诸如聚合物波导或光学数据存储设备之类的光学应用非常感兴趣。在这一贡献中,我们报道了带有邻硝基苄基和苯基酯基团的聚降冰片烯基共聚物的合成,该共聚物能够进行光诱导的裂解反应,并在随后的步骤中任选地在紫外线照射下进行光-弗里斯重排。通过FTIR,UV-VIS和椭圆偏振光谱法研究了这些芳族酯基的光反应。由于光反应性单元在紫外线吸收方面的差异,邻硝基苄基酯可以被300 nm以上的紫外线选择性地激发,而随后的254 nm照射则引起剩余苯基酯基团的光-弗里斯重排。紫外线照射下化学成分的结构变化导致聚合物材料的折射率发生明显变化。苯基酯基团的光-弗里斯重排引起折射率的显着增加,同时发现邻硝基苄基酯部分的光致裂解反应引起折射率的降低。这一事实使得能够通过选择所施加的波长来选择性地调整折射率。另外,使用一系列不同波长的两步辐照程序提供了擦除甚至反转折射率对比的可能性。

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