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Structural and luminescence properties of Eu and Er implanted Bi2O3 nanowires for optoelectronic applications

机译:用于光电应用的Eu和Er注入的Bi2O3纳米线的结构和发光特性

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Effective Er and Eu doping of α-Bi2O3 nanowires has been achieved by ion implantation. The nanostructures exhibit stable and efficient photoluminescence emission at room temperature after adequate annealing. X-ray photoelectron and X-ray absorption spectroscopy measurements reveal the incorporation of Er and Eu ions only in the desired trivalent charge state. The structural recovery of the implantation damage after thermal treatments was monitored by micro-Raman spectroscopy. Nanowires implanted with 300 keV ions and fluences in the range of 2 x 10~(15) to 8 x 10~(15) cm~(-2) show luminescence emission after annealing at 450 °C and 550 °C Samples implanted with Eu ions show Eu~(3+) emission lines at 543 nm (~5D1-~7F1 transition), 587 nm (~5D1-~7F3 transition), 613 and 622 nm (~5D0-~7F2 transitions). Er-implanted nanowires show luminescence in the red range between 650 and 680 nm, corresponding to Er~(3+) ~2F_(9/2)—~4l_(15/2) transitions. High angle annular dark field scanning transmission electron microscopy observations combined with energy dispersive X-ray microanalysis measurements reveal the formation of dopant-rich regions at higher fluences, leading to a reduced optical signal.
机译:通过离子注入已经实现了对α-Bi2O3纳米线的有效Er和Eu掺杂。适当退火后,纳米结构在室温下表现出稳定而有效的光致发光。 X射线光电子和X射线吸收光谱法的测量表明仅在所需的三价电荷状态下掺入了Er和Eu离子。通过显微拉曼光谱法监测热处理后植入损伤的结构恢复。植入300 keV离子且能量密度在2 x 10〜(15)至8 x 10〜(15)cm〜(-2)范围内的纳米线在450°C和550°C退火后显示出发光离子在543 nm(〜5D1-〜7F1跃迁),587 nm(〜5D1-〜7F3跃迁),613和622 nm(〜5D0-〜7F2跃迁)处显示Eu〜(3+)发射线。注入Er的纳米线在650至680 nm的红色范围内显示发光,对应于Er〜(3+)〜2F_(9/2)~~ 4l_(15/2)跃迁。高角度环形暗场扫描透射电子显微镜观察与能量色散X射线显微分析测量结果相结合,揭示了在较高通量下富掺杂剂区域的形成,从而导致光信号减少。

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