MeV Gold Ion Induced Sputtered Nanoparticles from Gold Nanostructures: Dependence of Incident Flux and Temperature

摘要

The high-energy and heavy-ion induced sputtered particles from nanostructures under various conditions can result in variety of size distributions. 1.5 MeV Au{sup}(2+) ions induced sputtering from isolated gold nanostructures deposited on silicon substrate have been studied as a function of incident ion flux (dose rate) and the sputter particle catcher at low temperature. At higher fluxes, a bimodal distribution of the sputtered particles has been observed. Cross-sectional transmission electron microscopy and Rutherford backscattering spectrometry measurements showed that the sputter particle size distribution depends on morphology at surface and interfaces. The results for the size distribution from a catcher at low temperature showed the less agglomeration of ejected clusters on the catcher grids, resulting in the lower-disperse size distribution.