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首页> 外文期刊>Journal of nanoscience and nanotechnology >Surface Nanostructuring of Boron-Doped Diamond Films and Their Electrochemical Performance
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Surface Nanostructuring of Boron-Doped Diamond Films and Their Electrochemical Performance

机译:掺硼金刚石薄膜的表面纳米结构及其电化学性能

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摘要

Uniform and vertically aligned nanocone and nanopillar arrays were successfully constructed on heavily boron-doped nanocrysatlline diamond films by carrying out bias-assisted reactive ion etching in hydrogen/argon plasmas. The electrochemical properties of the nanostructured boron-doped diamond films were investigated by cyclic voltammetry using 1 mM [Fe(CN)_6]~(3-/4-) as redox couple. Compared to the planar boron-doped nanocrystalline diamond film electrode, the surface nanostructuring of boron-doped diamond film electrodes demonstrate enhanced sensitivity due to their enlarged electro-active surface areas. The results indicated that boron-doped diamond nanocones and nanopillars are promising electrode materials which benefit to improve the efficiency, sensitivity and reproducibility of biomedical and chemical sensors.
机译:通过在氢/氩等离子体中进行偏压辅助反应离子刻蚀,在重硼掺杂的纳米晶金刚石膜上成功构建了均匀且垂直排列的纳米锥和纳米柱阵列。采用1 mM [Fe(CN)_6]〜(3- / 4-)作为氧化还原对,通过循环伏安法研究了纳米结构的掺硼金刚石薄膜的电化学性能。与平面掺杂硼的纳米晶金刚石膜电极相比,掺杂硼的金刚石膜电极的表面纳米结构由于其电活性表面积增大而显示出增强的灵敏度。结果表明,掺硼金刚石纳米锥和纳米柱是有前途的电极材料,有助于提高生物医学和化学传感器的效率,灵敏度和重现性。

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