Modulation of crystallinity in sputtered vanadium metal thin films grown on ion exchanged glasses

摘要

It is well known that crystallinity in thin films is a very important factor in determining their application as devices. The growth of crystalline thin films by physical vapour deposition techniques requires the optimization of a number of process and related parameters. The effects of rate of deposition, substrate temperature, pressure of operation, conditions of bombardment on the substrate, i.e. energy, flux and angle of bombarding particles, on the crystallinity in thin films have all been investigated in detail. It is also known that the other single most important parameter in controlling the crystallinity of thin films is the substrate on which the films are deposited. Recent work on the growth of high temperature superconducting thin films was especially significant in re-establishing the importance of the choice of substrate in determining the technological applicability of thin film materials [1]. There is, however, continuous work on the development of new substrates and their effects on thin film properties.