The sputtering target material for thin film formation which features that it consists of the metallic materials of 2 original alloys which the sputtering target material for thin film formation,

摘要

PPROBLEM TO BE SOLVED: To provide a sputtering target material for forming a thin film, which improves manufacturing easiness in a step of manufacturing an alloy, and stability and simplicity in a sputtering step when using it for a sputtering target. PSOLUTION: The sputtering target material for forming the thin film is made of a metallic material including Ag as a main component and 0.1-3.0 wt.% Mo. The use of such a sputtering target material for forming the thin film solves the problems in a prior art, and realizes a technology having various superior characteristics as the components of the various electronic components, electronic devices, optoelectronic components and optical recording media, while utilizing the advantages of Ag. PCOPYRIGHT: (C)2004,JPO&NCIPI