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首页> 外文期刊>Journal of Materials Science >STRUCTURE AND ELECTRICAL PROPERTIES OF VACUUM-DEPOSITED ANTIMONY TELLURIDE THIN FILMS ON AN AMORPHOUS SUBSTRATE
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STRUCTURE AND ELECTRICAL PROPERTIES OF VACUUM-DEPOSITED ANTIMONY TELLURIDE THIN FILMS ON AN AMORPHOUS SUBSTRATE

机译:非晶质基底上真空沉积的碲化锑薄膜的结构和电性能

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Sb2Te3 thin films, 50-109 nm thick, have been prepared by vacuum evaporation on to quartz substrates, Electrical properties of as-deposited and annealed films show that the activation energy is thickness dependent. Optical measurements indicate that there is an indirect transition having an energy of 1.9 eV. Transmission electron micrographs show the fine grains of the deposit. [References: 10]
机译:通过真空蒸发在石英基板上制备了厚度为50-109 nm的Sb2Te3薄膜。沉积和退火后的薄膜的电性能表明,活化能与厚度有关。光学测量表明存在一个间接过渡,能量为1.9 eV。透射电子显微照片显示了沉积物的细颗粒。 [参考:10]

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