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Development of a padless ultraprecision polishing method using electrorheological fluid

机译:使用电流变流体的无垫超精密抛光方法的开发

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摘要

A new kind of polishing method for mirror surface using the electrorheological (ER) fluid is presented. ER fluid is colloidal suspension and stiffens into semi-solid when subjected to an electric field. In this study, the mixture of the ER fluid and abrasives is used as polishing slurry. When the ER fluid is placed at the interface between a part and a moving platen, the friction force increases with the applied voltage. Since the polymeric ER particles separating two surfaces attract neighboring fine abrasives along the electric field across the gap, making the abrasives participate in material removal, they replace roles of pad used in a common mirror polishing. This paper analyzes the friction characteristics of the ER fluid at the sliding interface experimentally, and the behavior of the ER particles at the interface with and without the application of an electric field is observed optically. In addition, material removal rate of single crystal silicon according to the electric field strength is evaluated using the mixture of the ER fluid and diamond powders for a few conditions of different velocities and normal pressures. At last, average surface roughness of 2.9 nm is obtained as a result of the polishing of silicon surface whose average roughness is about 50 nm with the 0.25 μm diamond-mixed ER fluid.
机译:提出了一种使用电流变(ER)液对镜面进行抛光的新方法。 ER流体是胶体悬浮液,在电场作用下会变硬为半固体。在这项研究中,将ER流体和磨料的混合物用作抛光浆。当ER流体放置在零件和移动压板之间的界面时,摩擦力随施加的电压而增加。由于分隔两个表面的聚合物ER颗粒沿电场跨间隙吸引相邻的细磨料,使这些磨料参与材料的去除,因此它们取代了普通镜面抛光中使用的抛光垫的作用。本文通过实验分析了ER流体在滑动界面上的摩擦特性,并通过光学观察了有无电场作用下ER颗粒在界面处的行为。此外,在几种不同速度和常压条件下,使用ER流体和金刚石粉末的混合物,根据电场强度评估了单晶硅的材料去除率。最后,通过使用0.25μm的掺金刚石的ER流体对平均粗糙度为约50nm的硅表面进行抛光而获得了2.9nm的平均表面粗糙度。

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